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2100 sourcemeter  (Tektronix inc)

 
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    Structured Review

    Tektronix inc 2100 sourcemeter
    2100 Sourcemeter, supplied by Tektronix inc, used in various techniques. Bioz Stars score: 90/100, based on 1 PubMed citations. ZERO BIAS - scores, article reviews, protocol conditions and more
    https://www.bioz.com/product/2100+sourcemeter/2400+source+meter/pm32196304-328-10-9
    Average 90 stars, based on 1 article reviews
    2100 sourcemeter - by Bioz Stars, 2026-09
    90/100 stars

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    Related Articles

    other:

    Article Title: A Comparative Study of Compressible and Conductive Vertically Aligned Carbon Nanotube Forest in Different Polymer Matrixes for High-Performance Piezoresistive Force Sensors.
    Article Snippet: is published by the American Chemical Society.. 1155 Sixteenth Street N.W., Washington, DC 20036 Published by American Chemical Society.. Copyright © American Chemical Society.

    Article Title: The effect of synthesis conditions and humidity on current-voltage relations in electrodeposited ZnO-based Schottky junctions.
    Article Snippet: The current-voltage (I-V) characteristics of electrodeposits were collected with either a Hokuto Denko HA 501 potentiostat or a Keithley 2100 Sourcemeter under varying humidity conditions.

    Membrane:

    Article Title: Deep-collapse operation of capacitive micromachined ultrasonic transducers
    Article Snippet: .. The microfabrication process is performed on a low resistivity (<0.005 Ω-cm), ~330 μm thick silicon wafer, which constitutes the bottom electrode. over the surface of the bare silicon wafer, 200-nm-thick (= tg) sputtered chromium is used as the sacrificial layer, which determines the gap underneath the membrane. after photolithograph- 1 The leakage current measurement is performed using a Keithley 2100 sourcemeter (Keithley Instruments Inc., cleveland, oH). ic patterning, 400-nm (= ti) silicon nitride is deposited as the insulation layer between the electrodes. ..

    Insulation:

    Article Title: Deep-collapse operation of capacitive micromachined ultrasonic transducers
    Article Snippet: .. The microfabrication process is performed on a low resistivity (<0.005 Ω-cm), ~330 μm thick silicon wafer, which constitutes the bottom electrode. over the surface of the bare silicon wafer, 200-nm-thick (= tg) sputtered chromium is used as the sacrificial layer, which determines the gap underneath the membrane. after photolithograph- 1 The leakage current measurement is performed using a Keithley 2100 sourcemeter (Keithley Instruments Inc., cleveland, oH). ic patterning, 400-nm (= ti) silicon nitride is deposited as the insulation layer between the electrodes. ..



    Similar Products

    2100 sourcemeter  (Tektronix inc)
    90
    Tektronix inc 2100 sourcemeter
    2100 Sourcemeter, supplied by Tektronix inc, used in various techniques. Bioz Stars score: 90/100, based on 1 PubMed citations. ZERO BIAS - scores, article reviews, protocol conditions and more
    https://www.bioz.com/product/2100+sourcemeter/2400+source+meter/pm32196304-328-10-9
    Average 90 stars, based on 1 article reviews
    2100 sourcemeter - by Bioz Stars, 2026-09
    90/100 stars
    		  Buy from Supplier

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